Expert™ FAB/PS/LAB

Fully Automated VPD-ICP-MS

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• This is an innovative pretreatment system connected with ICP-MS to achieve fully automated analysis of metal impurities in Si wafers and others.
• The wafer is being processed in a VPD chamber for decomposition of films such as SiO and SiN by gaseous HF/H2O (Vapor phase decomposition, VPD), and impurities in the films remains on a bare wafer. The scan solution held by a special scanning nozzle scans the surface of bare wafer and the impurities are recovered in the scan solution. The recover scanned solution is transferred to a vial for ICP-MS analysis.
• PS, FAB and LAB models are available and they can also be custom-made to meet your specific purpose.
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